Niobium sputtering target has the same function as its raw material. Niobium is a strong, light grey, crystalline, and ductile transition metal. Pure Niobium has a hardness similar to that of pure titanium, and it has similar ductility to iron.Niobium is used in various superconducting materials. These superconducting alloys, also containing titanium and tin, are widely used in the superconducting magnets of MRI scanners. Other applications of niobium include welding, nuclear industries, electronics, optics, numismatics, and jewelry.

Niobium Sputtering Target is produced by EB melting technology, it's usually applied for touch screen, optical lenses and glass coatingusually applied for touch screen, optical lenses and glass coating.

XK is a professional producer of Niobium sputtering targets with various shapes and purity, which are mainly applied to semi-conductive & micro-electronics industry. Thanks to our special forming processes, our Niobium sputtering targets possess higher density, smaller average particle size as well as high purity, so that you can benefit from a faster process due to higher sputtering speed and obtain very homogeneous Niobium layers.

The microstructure can be adjusted by our flexibility production process, to achieve your desired effect. If the grains of the sputtering target are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers. Following are two micrographs of our niobium sputtering target, the average grain size＜100μm.