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Iron (Fe) Sputtering Target

  • Attributes Name
    High purity metal sputtering target
  • Product Name
    Iron Sputtering Target
  • Element Symbol
    Fe
  • Purity
    3N,3N5,4N
  • Shape
    Planar target, Rotary target
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Description
Reviews
High-purity iron（ Fe） sputtering target is an important material for preparing magnetic recording media, magnetic recording write heads, optoelectronic devices and magnetic sensors. 

The microstructure can be adjusted by our flexibility production process, to achieve your desired effect. If the grains of the sputtering target are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers. Following are two micrographs of our iron sputtering target, the average grain size＜100μm. 


Chemical Specification:


Our high purity sputtering target can make the film possess an outstanding level of electrical conductivity and minimize the particle formation during the PVD process. Following is a typical certificate of analysis for 4N iron sputtering target:


Related Sputtering Materials


FeNi sputtering target

FeCo sputtering target

FeCoV sputtering target

FeCrNi sputtering target

Fe2O3 sputtering target

FeSi sputtering target

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