Indium Gallium Zinc Oxide (IGZO) Sputtering Target

  • Attributes Name
    Ceramic Sputtering Target
  • Product Name
    Indium Gallium Zinc Oxide sputtering target
  • Element Symbol
    IGZO
  • Purity
    4N
  • Shape
    Planar
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Description
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Xinkang is a supplier of Indium Gallium Zinc Oxide (IGZO) Sputtering Targets with high quality at competitive price. IGZO sputtering target, whose full name is indium gallium zinc oxide target, which contains four elements: indium (In), gallium (Ga), zinc (Zn) and oxygen (O). IGZO is a new type of semiconductor material with higher electron mobility than amorphous silicon (α-Si). IGZO is used as a channel material in a new generation of high-performance thin-film transistors (TFTs) to improve display panel resolution and make large-screen OLED TVs possible.

IGZO Sputtering Target Application


IGZO sputter targets are used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc. The applications of IGZO thin films include transparent conductive oxide films, LED display, MEMS devices, etc.

IGZO Sputtering Target Features


Xinkang produce Indium Gallium Zinc Oxide (IGZO) Sputtering Targets with different shapes like disk, rectangle, column, step and custom shape. The typical diameter for circular targets include 1 inch, 2 inch, 3 inch, 4 inch or 50mm, 60mm, 80mm, 100mm etc. Typical thickness include 0.125 inch and 0.25 inch or 3mm, 4mm, 5mm, 6mm etc. 

Xinkang Sputtering targets can be bonded with copper backing plate as reuqest. Different purity, shape and size can also be custom-made for Indium Gallium Zinc Oxide (IGZO) Sputtering Targets. You can send us your inquiry for a quote.

From the selection of raw materials to the control of temperature, pressure and time of hot press sintering, we strictly follow the specific production process, thus the finished ceramic sputtering targets have the characteristics of high purity, high density, uniform surface color without spots and crack, the end user can obtain constant erosion rates and high pure and homogeneous thin films during PVD process.

Indium Gallium Zinc Oxide Sputtering Target
Purity: 99.99%;
Production Method: hot press sintering
Available dimensions:
Circular: Diameter = 1", 2", 3" and 4", other size can be customized
Rectangular: Length = 3mm and 6mm
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Ceramic Sputtering Targets | Xinkang Materials
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