Indium Gallium Zinc Oxide (IGZO) Sputtering Target

Products

Indium Gallium Zinc Oxide (IGZO) Sputtering Target

Attributes Name

Ceramic Sputtering Target
Product Name

Indium Gallium Zinc Oxide sputtering target
Element Symbol

IGZO
Purity

4N
Shape

Planar

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Description

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Xinkang is a supplier of Indium Gallium Zinc Oxide (IGZO) Sputtering Targets with high quality at competitive price. IGZO sputtering target, whose full name is indium gallium zinc oxide target, which contains four elements: indium (In), gallium (Ga), zinc (Zn) and oxygen (O). IGZO is a new type of semiconductor material with higher electron mobility than amorphous silicon (α-Si). IGZO is used as a channel material in a new generation of high-performance thin-film transistors (TFTs) to improve display panel resolution and make large-screen OLED TVs possible.

IGZO Sputtering Target Application

IGZO sputter targets are used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc. The applications of IGZO thin films include transparent conductive oxide films, LED display, MEMS devices, etc.

IGZO Sputtering Target Features

Xinkang produce Indium Gallium Zinc Oxide (IGZO) Sputtering Targets with different shapes like disk, rectangle, column, step and custom shape. The typical diameter for circular targets include 1 inch, 2 inch, 3 inch, 4 inch or 50mm, 60mm, 80mm, 100mm etc. Typical thickness include 0.125 inch and 0.25 inch or 3mm, 4mm, 5mm, 6mm etc.

Xinkang Sputtering targets can be bonded with copper backing plate as reuqest. Different purity, shape and size can also be custom-made for Indium Gallium Zinc Oxide (IGZO) Sputtering Targets. You can send us your inquiry for a quote.

From the selection of raw materials to the control of temperature, pressure and time of hot press sintering, we strictly follow the specific production process, thus the finished ceramic sputtering targets have the characteristics of high purity, high density, uniform surface color without spots and crack, the end user can obtain constant erosion rates and high pure and homogeneous thin films during PVD process.

Indium Gallium Zinc Oxide Sputtering Target

Purity: 99.99%;

Production Method: hot press sintering

Available dimensions:

Circular: Diameter = 1", 2", 3" and 4", other size can be customized

Rectangular: Length = 3mm and 6mm

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