Products

Aluminum Chromium (AlCr) Sputtering Target

Attributes Name

Alloy Sputtering Target
Product Name

Aluminum Chromium (AlCr) Sputtering Target
Element Symbol

AlCr
Purity

2N8,3N
Shape

Planar

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Description

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The aluminum-chromium alloy target produced by Xinkang adopts advanced hot isostatic pressing process. The products include rectangular target, arc target and large aspect ratio integrally formed tube target, etc., with a wide range of composition ratio, high purity and density, The advantages of small and uniform crystal grains and long service life. It can be adjusted freely according to customer requirements, and the actual density is close to 99%.

The following is the production process of aluminum chromium target

Raw materials - powder blending - sheathing - alloy powdering - sheath pressing - hot isostatic pressing - metallographic inspection - wire cutting - machining - dimensional inspection - cleaning-packaging

Metallographic inspection of aluminum-chromium alloy sputtering target

Through repeated forging, rolling and heat treatment, we can appropriately adjust the microstructure of the target material to achieve the effect you want. If the grain size of the sputtering target material is uniform, the user can obtain a good sputtering rate and uniform coating Floor. The picture below is a microscopic metallographic inspection picture of aluminum chromium (AlCr 70/30at%) sputtering target, with an average particle size <100μm.

Following is a typically Certificate of analysis for 3N Aluminum chromium (AlCr 70/30at%) sputtering target.

Available composition:

AlCr70/30at% Sputtering Target

AlCr50/50at% Sputtering Target

AlCr60/40at% Sputtering Target

AlCr30/70at% Sputtering Target

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